STC.UNM v. Intel Corporation
Filing
55
MEMORANDUM in Support re 54 MOTION to Compel filed by STC. UNM. (Attachments: # 1 Exhibit A, # 2 Exhibit B, # 3 Exhibit C, # 4 Exhibit D, # 5 Exhibit E, # 6 Exhibit F, # 7 Exhibit G, # 8 Exhibit H)(Pedersen, Steven)
STC.UNM v. Intel Corporation
Doc. 55 Att. 5
Exhibit E
Technical and Manufacturing Challenges and the Prospect for HVM using ArF Pitch Division, S. Sivakumar
Excerpts from
Dockets.Justia.com
Technical and Manufacturing Challenges and the Prospect for HVM using ArF Pitch Division
Sam Sivakumar
Intel Corporation
22nm Process 2011 HVM
1.2
1.35NA ArF PD EUV
0.9
1.35NA ArF
k1
0.6
0.93NA ArF
0.3
k1 = 0.3
0 100 90 80 70 60 1/2 Pitch (nm) 50 40 30 20
45nm
Siva kuma r 15
32nm
22nm
6 th International Symposium on Immersion Lithography Extensions
22nm SRAM Test Chip
SRAM, Logic, Mixed-Signal Test Circuits
SRAM, Logic, Mixed-Signal Test Circuits
Discrete Test Structures
Intel is first in the industry to demonstrate working 22 nm circuits
Siva kuma r 16
6 th International Symposium on Immersion Lithography Extensions
22nm SRAM Test Chip
0.092 um2 SRAM cell for high density applications
0.108 um2 SRAM cell for low voltage applications
0.092 um2 is the smallest SRAM cell in working circuits reported to date
6 th International Symposium on Immersion Lithography Extensions
Siva kuma r 17
15nm Process 2013 HVM
1.2
1.35NA ArF PD EUV
0.9
1.35NA ArF
k1
0.6
0.93NA ArF
0.3
k1 = 0.3
0 100 90 80 70 60 1/2 Pitch (nm) 50 40 30 20
45nm
Siva kuma r 18
32nm
22nm
15nm
6 th International Symposium on Immersion Lithography Extensions
Pitch Division
Double Patterning LELE LFLE Spacer
Siva kuma r 19
6 th International Symposium on Immersion Lithography Extensions
Double Patterning for L/S - LELE
Siva kuma r 20
6 th International Symposium on Immersion Lithography Extensions
Double Patterning for Vias - LELE
+
Several different PD options will be picked and used depending on layer-by-layer applicability
Siva kuma r 21
6 th International Symposium on Immersion Lithography Extensions
Disclaimer: Justia Dockets & Filings provides public litigation records from the federal appellate and district courts. These filings and docket sheets should not be considered findings of fact or liability, nor do they necessarily reflect the view of Justia.
Why Is My Information Online?